The Tech Cold War’s ‘Most Complicated Machine’ That’s Out of China’s Reach – The New York Times

The new system also required redesigned components called photomasks, which act like stencils in projecting circuit designs, as well as new chemicals deposited on wafers that generate those images wh… [+1344 chars]

View The Article On: New York Times

Powered By

Click to comment

Leave a Reply

Your email address will not be published. Required fields are marked *

To Top